AlN Heater - Semiconductor Ceramic - Semiconductor Ceramics

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AlN Heater

In the field of semiconductor manufacturing, AlN heaters (Aluminum Nitride Heater) are becoming key equipment in the industry with their excellent performance and wide application. AlN heaters supplied by Cersol provide reliable solutions for processes such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) in the semiconductor manufacturing process.

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Core advantages of AlN heaters
AlN heaters use high-performance aluminum nitride (AlN) material, which is known for its excellent thermal conductivity (up to 210 W/mK), mechanical strength and chemical stability. AlN heaters can operate stably at temperatures up to 650°C. In addition, the heating rate of AlN heaters can reach 190°C/second, which can quickly respond to process requirements and improve production efficiency.

Diversified design of AlN heaters
Cersol's AlN heaters are flexible in design and can meet the processing needs of silicon wafers of different sizes. Whether it is 150mm, 200mm or 300mm silicon wafers, AlN heaters can provide precise heating solutions. Its design not only supports single-zone heating, but also meets complex dual-zone heating needs, providing process engineers with more flexibility and options.

Integrated features of AlN heaters
The integrated design of AlN heaters is another highlight. It can embed RF ground electrodes and electrostatic adsorption electrodes, which make AlN heaters perform well in processes such as plasma enhanced chemical vapor deposition (PE-CVD) and atomic layer deposition (ALD). This integrated design not only improves the reliability of the equipment, but also reduces the need for external connections and simplifies the process flow.

Application scope of AlN heaters
AlN heaters are widely used in a variety of chemical vapor deposition processes, including atmospheric pressure chemical vapor deposition (APCVD), low pressure chemical vapor deposition (LPCVD) and subatmospheric pressure chemical vapor deposition (SACVD). In these processes, AlN heaters provide strong support for the deposition of high-quality thin films with their excellent thermal performance and chemical stability. In addition, the application of AlN heaters in atomic layer deposition (ALD) processes has also received increasing attention. Their precise temperature control and uniformity performance provide a guarantee for the high-precision requirements of the ALD process.

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