Silicon Carbide(SiC) Etching Focus Ring
The function of the focus ring is to provide balanced plasma, which requires similar electrical conductivity to that of silicon wafers. In the past, the material used was mainly conductive silicon, but fluorine-containing plasma will react with silicon to form volatile silicon fluoride, which greatly shortens its service life, resulting in frequent replacement of components and reduced production efficiency. SiC has similar electrical conductivity to single-crystal Si and better resistance to plasma etching, so it can be used as a material for focus rings.
